Effect of various processing parameters on the properties of ZnO thin films

Abstract

Zinc oxide (ZnO) thin films are essential in opto-/piezo-electronics due to their transparency, high electron mobility, wide bandgap (∼3.37 eV), and high excitonic binding energy (60 meV). Effects of processing parameters on ZnO thin films, such as the molarity, ageing, thickness, and calcination temperature, on the microstructural and optical properties deposited by sol-gel spin-coating are investigated under one roof. X-ray diffraction (XRD) confirmed the polycrystalline nature of all films, along with a dominant orientation (002) plane, indicating the formation of a c-axis oriented hexagonal wurtzite structure of ZnO regardless of the processing parameters. Peak intensities varied for all samples and exhibited the highest peak intensity annealed at 500 °C, which correlates with the increase in crystallite size from 15.93 to 16.41 nm due to a decrease in defect density via the thermal expansion. 0.4 M aged solution over 70 h showed the variation in the crystallite size and dislocation density, indicating the improvements in the thin film quality. Thickness-dependent ZnO thin films also improved the crystallinity, which was confirmed by high peak intensities. Decreasing the Urbach energy (Eu) of 0.4 M solution indicates reduced lattice imperfections/defects and high electronic quality of thin-film materials. Deposited ZnO films with an ageing time of 70 h and thickness of 109 nm exhibit the highest refractive index of 3.9 and 2.6, indicating light interaction and optimal density. The optimized conditions of sol-gel derived ZnO thin films augment the ease of development of economic devices for practical implications in opto-/piezo-electronics.