Abstract
Vacuum-annealing was carried out on the pure indium oxide films deposited on Si (100) substrates by radiofrequency magnetron sputtering. Oxygen-deficiency states and room temperature d0 ferromagnetism were both detected in the as-grown and vacuum-annealed films. With more oxygen vacancies appeared through vacuum-annealing, the saturation magnetization increased rapidly from 0.5 to 5.5emu/cm3. The connection between the highly oxygen-deficiency states and the strong magnetic moment suggests that oxygen vacancies play a crucial role in mediating the ferromagnetism in In2O3 films. We think that this d0 ferromagnetism mainly stems from V0+ and oxygen vacancy clusters in the interfaces or grain boundaries.
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