Abstract
Electrostatic discharge behavior of integrated SiGe heterojunction bipolar transistors is investigated by transmission line pulse (TLP) and transient interferometric mapping techniques. When stressing collector - base junction in reverse direction, two distinct non-thermal failure modes, depending on TLP pulse rise time (RT), have been found: For RT ≥ 10 ns the observed failure at a critical voltage is attributed to base corner breakdown as supported by failure analysis. For RT ≤ 5 ns the failure occurs due to parasitic capacitance coupling which virtually short-circuits the base-emitter junction at the pulse beginning and thus induces a parasitic bipolar action.
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