Abstract
Photoactive TiO2 layers were formed by anodic oxidation of Ti in O2 RF plasma under various conditions and Ti surface pretreatment. The photocurrent spectrum in 1M NaOH was used to calculate the quantum efficiency of the photocurrent production and the band-gap energy for indirect transitions. Photoelectrochemical properties of TiO2 layers were studied on the decomposition of p-cresol water solution. The method of Ti surface pretreatment (mechanical polishing or chemical etching) has a decisive influence on the photoelectrochemical properties and the structure of the polycrystalline oxide, rutile, anatase or amorphous phase content.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
