Abstract
The effect of threading dislocations on electron transport in In0.24Ga0.76N/GaN multiple quantum wells has been studied by using transmission electron microscopy (TEM) and van der Pauw Hall effect measurements. From the cross-sectional TEM imaging, we observed the threading dislocations which “screw” through the multiple In0.24Ga0.76N/GaN quantum well. From the Hall effect measurement, we found that the Hall mobility decreases as the temperature decreases (μ∼T3/2) due to the threading dislocation scattering, and the Hall carrier concentration shows a transition from conduction-band transport to localized-state-hopping transport. The thermal activation energy of the residual donor level (probably Si) is about 20.2 meV.
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