Abstract
The report presents the effects of the thickness on the TiO2 thin films prepared by the GLAD technique with incline spinning substrate on rotating holder (ISSRH) by using the electron beam evaporation. The prepared films were heated at 500 °C for 2 hr in air. The microstructure of films was investigated by UV- visible photometer, X-ray diffraction, XRD and field emission scanning electron microscope, FE-SEM. The results showed the thickness of 10, 50, 100 and 300 nm films exhibited continuity distribution of the crystalline. The crystalline structure evidenced the dominant peak at the 300 nm thickness. GLAD TiO2 films exhibited the columnar growth and porosity. The TiO2 nanostructures showed rutile phase.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
