Abstract

Cr doped TiN films were prepared on metal substrates via heating magnetron sputtering at different deposition temperatures (200 °C–350 °C). Vacuum thermal activation energy caused by heating obviously affect the microstructure, hydrophobicity, conductivity and corrosion resistance performance which were systematically investigated. The thickness of the Cr doped TiN films reduced from 573.1 nm to 487.5 nm with the elevating substrate temperature, increasing the films density and hydrophobicity. The maximum water contact Angle is 115.86° and minimum interfacial contact resistance (ICR) is 3.62 mΩ cm2 at 350 °C of which the electrical conductivity completely satisfy with the DOE target (<10 mΩ cm2), indicating a potential application of Cr doped TiN films on stainless steel (SS) for metal bipolar plate.

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