Abstract
Ultraviolet irradiation has a positive effect on the optical properties of thin films. MgF 2 thin films were thermally evaporated and TiO 2 thin films were formed by an electron beam gun. The thicknesses of thin films were 5λ/4 and 7λ/4 for λ = 550 nm. The index of refraction ( n), extinction coefficient ( k) and physical thickness ( d) of MgF 2 and TiO 2 thin films were calculated using their spectral curves and discussed. The Cauchy dispersion relation was used for the calculation of dispersion of refractive indexes of MgF 2 and TiO 2. Results for optical constants for layers before and after exposure to the uv irradiation are presented. The influence of uv irradiation on the nine layer antireflection coating made of MgF 2 and TiO 2 layers is shown regarding spectral (λ = 450–1100 nm) and climo-mechanical characteristics.
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