Abstract
In this paper, we present the results of an experimental study of the influence of the ultra-low arsenic flux on the parameters of In nanodroplets obtained by droplet epitaxy on the GaAs substrate. We demonstrate that the arsenic flux can be used to alter the size of droplets without changing their surface density. An increase in the arsenic flux leads to a reduction of the nanostructure size or their complete decay. However, we demonstrate that certain growth conditions allow providing saturation of the size of nanostructures (∼30 nm) which ensures good reproducibility of the process. The mechanism of ring and hole formation at various arsenic fluxes is also discussed.
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