Abstract
Extreme ultraviolet (EUV) emission from Xe plasma in the λ=13.5nm band is theoretically investigated for lithographic application. It appears that a large number of satellite lines due to the 4d–4f, 4d–5p, and 4p–4d transitions significantly contribute to the emission over the spectral range from 10to17nm. At electron densities above 1020∕cm3, laser-produced Xe plasmas attain quasilocal thermodynamic equilibrium (LTE) in order to make the emission intensity in the 13.5nm band comparable to that in the 11nm band.
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