Abstract
Ba and Sr precursors for (Ba,Sr)TiO 3 films have been studied including (1) M(tmhd) 2 -Lewis base adduct (M = Ba or Sr, tmhd = tetramethylheptanedionate), (2) M(ketoester) 2 , (3) M(diester) 2 , and (4) M(methd) 2 (methd = methoxyethoxytetramethyl-heptanedionate). In case of ketoester and diester ligands, premature dissociation of the ligand was observed while M(methd) 2 shows good volatility and stability. Boiling point of Lewis base has a strong effect on the volatility of M(tmhd) 2 -Lewis base. Most of the Ti precursors were easily evaporated at low temperatures and thermal stability of Ti precursors could be controlled with diketone and alkoxide ligands. Ti(mpd)(tmhd) 2 (mpd = methyl- pentanediol) shows higher thermal stability than Ti(i-OPr) 2 (tmhd) 2 or Ti(dmae) 4 (dmae = dimethylaminoethoxide). To characterize the deposition behavior, (Ba,Sr)TiO 3 films were deposited at the deposition temperature of 400 ∼ 480°C using a direct liquid injection method. Composition uniformity and step coverage were largely affected by Ti precursors.
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