Effect of the Nanoscale Surface Relief on the Sputtering of Amorphous Carbon

Abstract

In the binary collision approximation, the computer simulation of amorphous-carbon sputtering under bombardment with Ar ions with an energy of 1—10 keV is carried out with inclusion of the surface nanorelief of sinusoidal form. The angular characteristics of the target sputtering yield are obtained for different relief parameters. The simulation results are compared with analytical estimates and Monte Carlo calculations based on Sigmund sputtering theory. The simulation does not confirm a sharp increase in the sputtering yield of the undulating surface with increasing relief amplitude, which was predicted theoretically (Makeev, Barabasi). Significant discrepancies in the angular dependences of the sputtering yield are also observed. The calculation results are compared with existing experimental data.