Effect of the N-doping concentration on the formation of the wide carrot defect in 4H-SiC homoepitaxial layer grown by trichlorosilane (TCS) as silicon precursor

Abstract

The effect of epilayer growth system, growth rate and N-doping concentration on the formation of the wide carrot defects in 4H-SiC homoepitaxial layer was investigated in this work. We found that the wide carrot defect formed on 4H-SiC epilayer only with low N-doping concentration of 5 × 1014 cm−3 grown by the SiHCl3+C2H4+H2 (TCS) system, which is different with the previous reports on the SiH4+C3H8+H2 growth system that can form such defect regardless of N-doping concentration. Besides, such wide carrot defect was never found on high speed growth of epilayer surface grown by TCS growth system. The morphology and structure of wide carrot defects were characterized by optical microscope (OM), micro-photoluminescence (PL) spectroscopy, atomic force microscope (AFM) and molten KOH etching. We speculate that the amount of wide carrot defects is related with the basal plane dislocations (BPDs) density which depends on the epitaxial growth system, growth rate of epilayer and the N-doping concentration. The formation mechanism and elimination methods of these wide carrot defects were proposed.