Abstract

Nowadays modern science and technology require development of efficient electromagnetic emitters covering far GHz and THz ranges. Semiconductor elements with negative differential resistance (NDR) such as Gunn diodes based on GaAs and InP are well-established powerful microwave emitters. In this work the Gunn diode structure based on single GaN nanowire with the potential of THz device development was proposed and investigated both theoretically and experimentally. According to the results of the numerical modeling, the Gunn generation can be obtained in the proposed geometry. Dependence of the doping concentration on the NW length necessary for the electrons domain formation was obtained. The nanostructures were grown via molecular beam epitaxy technique. Contacts to single nanowires were fabricated with the combination of e-beam lithography and thermal evaporation. It was shown experimentally that the volt-ampere characteristics of the GaN nanowire structure possess current saturation region. Experimental results correspond well to proposed numerical model.

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