Abstract
The effect of chemical treatment by chloroform at different immersion time values of 30, 50, and 70 min has been studied on the structural, morphological, electrical properties, and gas sensitivity against NO2 gas for CuPcTs/Alq3 thin films. The X-ray diffraction (XRD) was shown that the crystal size decreased from 4.8 to 2.7 nm with increasing immersion time to 50 min and then transferred to amorphous at 70 min. The atomic force microscopy (AFM) measurements for the untreated and chemically treated films with chloroform was shown that the average particle diameter decreased at 50 minutes of immersing time and then increased at 70 minutes. At 50 minutes of treatment time, the electrical properties of the thin films improved and the gas sensor measurements for NO2 were shown the best sensitivity at 373 K.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
