Abstract
The nanocrystalline nickel thin films with high density nano-scale growth twins were synthesized by means of pulse electrodeposition technology. Three samples were deposited at different bath temperatures of 30, 50 and 80 , by keeping all the other parameters as constant, such as electrolyte, pH value, current density and on-time and off-time period. The effect of temperature on deposition rate, sample texture, grain size, and twin boundary length and twin lamella thickness were systematically analyzed by SEM, XRD and TEM techniques. The microscopical feature of twin boundary were investigated by HRTEM. The results show that the nano-twinned nickel films deposited at the rates ranging from 20 nm/s to 30 nm/s have a preferred growth plane of (220) when de- posited at 30 and 50 , but changes to (200) when the temperature increases to 80 . With increasing
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