Abstract
The results from experimental and theoretical studies of the effect of technological factors on the micromagnetic states of multilayer magnetoresistive structures are presented. Spin-valve structures are deposited via magnetron sputtering. The resulting experimental samples were characterized using Kerr effect microscopy. A theoretical analysis of the effect of technological imperfections on hysteresis loop of such structures is performed by means of micromagnetic modeling.
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Schedule a callMore From: Bulletin of The Russian Academy of Sciences: Physics
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