Effect of target–substrate distance onto the nanostructured rhodium thin films via PLD technique

A T T Mostako,Alika Khare

doi:10.1007/s13204-012-0081-0

A T T Mostako, Alika Khare

Open Access

https://doi.org/10.1007/s13204-012-0081-0

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Journal: Applied nanoscience	Publication Date: Mar 25, 2012
Citations: 22	License type: cc-by

Affiliation: Indian Institute of Technology Guwahati

Abstract

Rhodium thin films on highly polished stainless steel substrates were fabricated via pulsed laser deposition (PLD) technique. The PLD films of rhodium were observed to be preferentially oriented in Rh(111) plane. The films showed dense columnar structure of nanometric crystallites. The effects of target–substrate distance onto the root mean square roughness, crystal structure, reflectivity and thickness of the PLD rhodium films were investigated.

Highlights

Rhodium thin films on highly polished stainless steel substrates were fabricated via pulsed laser deposition (PLD) technique
There are few reports on the Rh thin films fabricated via pulsed laser deposition (PLD) technique (Drogoff et al 1999; Saidani et al 2011)
The nanostructured Rh thin films fabricated via PLD technique are reported in this present paper

Summary

Introduction

Rhodium thin films on highly polished stainless steel substrates were fabricated via pulsed laser deposition (PLD) technique. There are few reports on the Rh thin films fabricated via pulsed laser deposition (PLD) technique (Drogoff et al 1999; Saidani et al 2011). Rhodium thin films have generated intense research interest due to its unique magnetic, chemical and physical properties. It shows novel magnetic properties in reduced dimensionality (Bhaskar et al 2008). Rhodium has potential application in microelectronics (Drogoff et al 1999; Herd et al 1983), gas sensors

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