Abstract
Graphene was attended widely in recent years because of its excellent performance in electrical, mechanical, optical and magnetic applications. X-ray photoelectron spectroscopy (XPS) is commonly used tools for studying the chemical binding state, chemical modification, heteroatom dopants and quantitative chemical composition of graphene. In this work, XPS characterization of graphene films, obtained through reduction and then thermal treatment of graphene oxide films, was studied. The XPS of the graphene films are performed by direct testing, Ar+ etching, and direct peeling of the surface layer. The result shows that for graphene film, direct peeling is a simple and easy to use low-cost treatment, which can also be extended to XPS testing of other two-dimensional (2D) materials.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
