Abstract
The field-effect transistors (FETs) based on reduced graphene oxide (rGO) with SiO2, porous silicon (PS), and oxidized porous silicon (PSox) supporting layers were obtained. The influence of charged impurities in the silicon substrate and electrically active defects in the support layers on the electrical properties of the FETs was studied based on the capacitance-voltage characteristic analysis. Localized electron states in the SiO2, PS, and PSox supporting layers that affect the charge transfer in the rGO-based FETs were determined using thermally stimulated depolarization spectroscopy. The influence mechanisms of various supporting layers on the electrical characteristics of the obtained FETs are discussed.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
