Effect of substrates on epitaxial PZT films by a coating photolysis process

Abstract

Preparation of Pb(Zr,Ti)O 3 (PZT) films on single crystalline STO(0 0 1), LAO(0 0 1) and MgO(0 0 1) substrates was investigated by a coating photolysis process using excimer laser. The effects of the substrate on the product films were examined by FT-IR, UV, XRD (theta–2theta, pole-figure analysis). In the case of using STO and LAO substrates, c-axis oriented films were successfully obtained by an ArF laser irradiation without heat treatment. Crystallinity of the PZT films prepared by a coating photolysis was found to strongly depend on the substrate used compared to conventional thermal process. Using XRD pole-figure analysis for the PZT films on STO substrates, it was found that the films were highly in-plane aligned. The formation mechanisms by a coating photolysis process are also discussed by a photothermal reaction due to both substrate materials and MO starting materials.