Abstract
This study investigates the effect of substrate temperature ranging from 30 0C to 150 0C on micro-structural and optical properties of ZnO thin films. RF sputtering method is used for the deposition of thin films on p- type Si substrate. The X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM) study is used for the investigation of different micro-structural and surface morphological properties of ZnO thin films. XRD results portrays hexagonal wurtzite structure, indices (0 0 2) preferred orientation thin films. UV–VIS-NIR spectroscopy and photoluminescence spectroscopy are employed to find the optical parameters of deposited ZnO thin films. It has been observed that the deposited thin films are highly transparent with the transmittance greater than 85% and their refractive index varying from1.75 to 2.75 as the substrate temperature changes from 30 0C to 150 0C. Various optical parameters like transmittance (T), absorption (A) and their outcomes are also examined and reported. The optical band gap shows a marginal variation from 3.22 eV to 3.26 eV.
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