Year-end Sale % OFF 
Abstract
The diffusion of water in silica glass was measured as a function of applied uniaxial stress and hydrostatic pressure at selected temperatures. It was found that the diffusion coefficient of water increased exponentially with increasing tensile stress and decreased with increasing compressive stress and increasing hydrostatic pressure. The activation volume for water diffusion in silica glass was found to be ∼170 cm3/mol at 192°C and ∼72 cm3/mol at 350°C. The solubility of water in glass showed a trend opposite to the diffusion coefficient, namely, it decreased exponentially with increasing tensile stress and increased with increasing compressive stress and hydrostatic pressure. These stress (or pressure) dependences were attributed to the shift of the glass‐water reaction equilibrium.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
