Effect of Strain on Structure and Morphology of Ultrathin Ge Films on Si(001).

Abstract

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTEffect of Strain on Structure and Morphology of Ultrathin Ge Films on Si(001)Feng Liu, Fang Wu, and M. G. LagallyView Author Information University of WisconsinMadison, Madison, Wisconsin 53706 Cite this: Chem. Rev. 1997, 97, 4, 1045–1062Publication Date (Web):June 20, 1997Publication History Received26 February 1997Revised17 April 1997Published online20 June 1997Published inissue 1 June 1997https://doi.org/10.1021/cr9600722Copyright © 1997 American Chemical SocietyRIGHTS & PERMISSIONSArticle Views712Altmetric-Citations125LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit Read OnlinePDF (538 KB) Get e-AlertsSUBJECTS:Defects in solids,Energy,Oligomers,Scanning tunneling microscopy,Stress Get e-Alerts