Abstract
Ti6Al4V thin film was prepared on glass substrate by RFsputtering method. The effect of RF power on the optical propertiesof the thin films has been investigated using UV-visibleSpectrophotometer. It's found that the absorbance and the extinctioncoefficient (k) for deposited thin films increase with increasingapplied power, while another parameters such as dielectric constantand refractive index decrease with increasing RF power.
Highlights
Thin metal films has attracted large scientific and practical interest since their specific properties enable various applications as transparent conductive coatings for UV spectrum [1, 2], transparent electrodes for “smart windows” and solar cells [3]
Experimental setup In our study (Ti6Al4V) thin films prepared by using RF Sputtering (USmade, CRC 600 magnetron sputtering system) as shows Fig
The optical properties measurements for (Ti6Al4V) thin films obtained by using the UV-Visible recording Spectrometer (UV-2601 PC Shimadzu software 1700, 1650), made in Japan
Summary
Thin metal films has attracted large scientific and practical interest since their specific properties enable various applications as transparent conductive coatings for UV spectrum [1, 2], transparent electrodes for “smart windows” and solar cells [3]. Key words Thin Films, RF Sputtering, Optical Properties, Ti6Al4V.
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