Abstract
We have successfully deposited anatase TiO2 thin films at room temperature on polycarbonate substrates by RF magnetron sputtering. Four deposition parameters including RF power, sputtering pressure, argon/oxygen ratio and deposition time were employed to realize the photocatalytic activities of TiO2 films. The orthogonal array and analysis of variance (ANOVA) were adopted to determine the performance of the deposition process. The RF power was found to be the major factor affecting the photocatalytic properties. An increase in RF power could be improved the deposition rate, contact angle, and MB absorbance.
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