Abstract
FePt films were prepared by RF sputtering using Ne, Ar, and Kr as sputtering gas. The effects of sputtering gas on the microstructure and magnetic properties were studied. Both magnetic and crystallographic properties show that Kr gas promotes the formation of L1 0 phase. The films prepared by using Ar and Ne gas have random orientation, whereas the films prepared by using Kr gas show preferential c-axis perpendicular to the film plane orientation.
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