Abstract

The transmittance and surface smoothness of SnO2 thin films directly affect the performance and use of optical devices, while sputtering conditions determine the morphology and optical properties of SnO2 thin films. In order to study the effect of sputtering conditions on the morphology and optical properties of SnO2 films, the FJL-560 Magnetron sputtering system was used to prepare SnO2 films at different sputtering temperatures on silicon and glass substrates. The results show that the sputtering temperature has a significant impact on the crystallinity of SnO2 thin films. Silicon-based SnO2 thin films can achieve the optimal crystallization state at room temperature, while glass-based SnO2 thin films have an optimal crystallization temperature of 250 °C. The higher the sputtering temperature, the larger the grain size of the thin films; The substrate and temperature did not have a significant impact on the Raman spectrum peak position and waveform of SnO2 thin films, while the Raman spectrum peak intensity of glass substrate was significantly stronger than that of silicon substrate; The average transmittance of SnO2 thin film can reach around 80%, and as the sputtering temperature increases, the transmittance of the film decreases.

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