Abstract
Reliable protection of the screens of next-generation mobile devices requires the use of transparent materials which are stronger than glass. In the present work the influence of the conditions of sitallization on the structure and properties of sitalls based on the system ZnO–MgO–Al2O3–SiO2 was studied; it was shown that these sitalls show promise for such purposes. Optimization of the sitallization regime makes it possible to increase the microhardness of the materials to > 900 HV while preserving transparency.
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