Abstract
Examination was made of the thermal oxidation of thin films (33120 μ m) of trilinolenoyl-glycerol (TLNG) with and without methyl polysiloxane (SO ; 1000 ppm) under an oxygen atomosphere thermal gravimetric analysis using thermal programs (5°C/min). The following results were obtained : 1) The rate of residual weight of TLNG (RRW TLNG) with SO exceeded that of TLNG without SO in the temperature range, 170 to 300°C.2) The temperature of the maindecomposition of TLNG with SO was higher than that of TLNG without SO.3) For film samples of thickness from 50 to 120 μ m, the relationship between temperature and effect of heat-resistance of TLNG with and without SO is apparent from the following data :
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