Effect of silicon on relaxation of the crystal lattice in MOCVD–hydride Al x Ga1 − x As:Si/GaAs(100) heterostructures

Abstract

The X-ray diffraction and infrared spectroscopy data for MOCVD-hydride AlxGa1 − xAs:Si/GaAs(100) heterostructures and homoepitaxial GaAs:Si/GaAs(100) structures doped with Si to a content of up to ∼1 at % are reported. It is shown that, in the homoepitaxial heterostructures, the formation of alloys with Si yields a decrease in the crystal lattice parameters of the epitaxial layer and a negative lattice mismatch with the single-crystal substrate (Δa < 0). At the same time, the formation of quaternary alloys in the AlxGa1 − xAs:Si/GaAs(100) heterostructures is not accompanied by any pronounced strains in the crystal lattice. By introducing Si into the epitaxial layers of these heterostructures, it is possible to attain complete matching of crystal lattice parameters of the film and substrate in the appropriately chosen technological conditions of growth of the epitaxial layers.