Effect of seeding density on the growth of diamond films by hot-filament chemical vapor deposition from sparse to dense range

Abstract

A systematic study is reported on the effects of nano-diamond seeding density on the growth, quality, and morphology of diamond films. A process is described to examine nano-diamond seeding densities 4 × 108, 8 × 1010, and 2 × 1012 cm−2 on silicon wafers. The diamond film is grown using hot-filament chemical vapor deposition with CH4/H2/O2 feed gases and varying growth time to determine properties at coalescence and as thickness increases. Polycrystalline morphology is examined by scanning electron and atomic force microscopy. Both vertical and lateral growth rates are found to be higher for sparse seeding prior to coalescence. Following coalescence, the growth rate is similar for all densities. The development of polycrystals is found to be influenced by the initial growth with smaller mean lateral size at higher seeding density and reduced surface roughness that also improves with thickness to reach ≲90 nm at a thickness of 6.4 μm. The crystal quality is examined by micro-Raman spectroscopy from the sample surfaces and line images from cross sections. Narrowing of the diamond phonon peak shows material quality to improve with the thickness, at a given seed density, and as density increases. Concomitant improvements are seen from the relative intensity of the diamond phonon and Raman bands from non-diamond carbon. Cross-section micro-Raman results suggest improved diamond film quality and crystallinity near the substrate interface as well as at the growth surface for the film grown with 2 × 1012 cm−2 seed density compared to 4 × 108 and 8 × 1010 cm−2. X-ray photoelectron spectroscopy confirms these trends at the diamond surface.