Abstract
Optimization of titanium dioxide (TiO2) nanostructures deposited on glass substrate by Radio Frequency (RF) magnetron sputtering has been studied. The aim of this paper is to determine which parameter of RF powers influence the optimization of TiO2 nanostructures. The surface morphology and topology, roughness properties and cross-sectional of TiO2 nanostructures were observed by Atomic Force Microscope (AFM). The particle size of TiO2 nanostructures were observed by Field Emission Scanning Electrons Microscope (FESEM) and the UV-vis transmission spectra were recorded using UV-vis spectroscopy. The lowest surface roughness has the smallest average TiO2 size particle with indirect optical band gap of 3.39 eV for optimum TiO2 nanostructures deposited at varies RF power.
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