Abstract
We have found that the effective thermal resistance of carbon nanofibre (CNF) arrays can be reduced significantly (by as much as 30%) by using rapid thermal annealing (RTA). The RTA was carried out in the temperature range 800–1050°C for about 1 min in the H2 and N2 atmosphere. We attribute the observed reduction in the thermal resistance to the improved quality of the CNF material, as well as to the decrease in the contact resistance at the interface between the array and its (silicon) substrate. The improvement in the quality of the CNF material has been established on the basis of the Raman spectroscopy. We suggest a suitable criterion (‘figure of merit’) to characterize the CNF material quality. A photothermal method is employed in our analysis to assess the level of the interfacial resistance. We conclude that RTA can result in substantial improvement in the thermal properties of the CNF materials. We also conclude that the application of Raman spectroscopy enables one to establish, in an effective and non-destructive fashion, a useful criterion of the CNF material quality.
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