Abstract
We have used investigations of low-temperature photoluminescence and thermally stimulated luminescence to study the effect of acetophenone and pyrene dopants on the photochemical stability of poly(methylphenylsilane) (PMPS) films. We have established that pure PMPS films and acetophenone-doped PMPS films degrade on exposure to UV radiation due to breaking of Si-Si bonds followed by formation of crosslinks between the macromolecules. At the same time, pyrene inhibits degradation of PMPS to a significant extent. This proves that photoinduced breaking of the Si-Si bond can occur upon excitation of the macromolecule to the first triplet T1(σσ*) state, since acetophenone sensitizes while pyrene quenches the intrinsic phosphorescence of PMPS. So the photochemical stability of PMPS can be improved by introducing a dopant which quenches triplet excitations of the macromolecule.
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