Abstract
This study has compared the void microstructure in nickel induced by a pulsed ion bombardment to that induced by a steady-state irradiation. Pulse cycles of 10 seconds on and 10 seconds off produced no measurable difference in the void growth and swelling in the temperature range 775 to 975 K compared to continuous irradiation at the same instantaneous dose rate. Void annealing during the pulse annealing period was minimal due to the large void sizes which were obtained in these irradiations. Hence no measurable effect of pulsing on void growth was observed.
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