Year-end Sale % OFF 
Abstract
A diamond-like carbon (DLC) film was deposited using unipolar-double-pulse high-power pulsed magnetron sputtering, aimed at enhancing both film density and deposition rate. The pulse interval between the 1st and 2nd pulses, with negative polarity applied to the target, was varied from 15 to 200 μs. Temporal variations in the flux and energy of C+ and Ar+ incident to the DLC film were analyzed through energy-resolved and time-resolved mass spectrometry to clarify the ion generation process during the 1st and 2nd pulses. The contribution of ionic species in forming the DLC film through HiPIMS was clarified through mass spectrometry, Raman scattering spectroscopy, and X-ray reflectivity analyses. Reducing the pulse interval increased the deposition rate, and the film density of the DLC film was improved at a pulse interval of approximately 40 μs. Overall, the implementation of a double pulse with the appropriate pulse interval can help enhance both the film density and deposition rate.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
