Effect of process parameters on fixed abrasive pad self-conditioning in micro/nano machining

Abstract

ABSTRACTFixed abrasive lapping/polishing technology, one of micro/nano machining directions, is adopted to achieve micro/nano precision surface quality and high productivity. Fixed abrasive pad (FAP) plays an important role in fixed abrasive polishing process, and its self-conditioning has an important influence on machining stability and processing efficiency in micro/nano machining. To make clear the effect of process parameters on FAP self-conditioning, slurry pH, pressure, and pad speed were investigated in fixed abrasive polishing of K9 glass, respectively. And material removal rate (MRR), pad wear rate (PWR), wear ratio, FAP surface topography, friction coefficient (COF) and acoustic emission (AE) were analyzed in micro/nano machining of K9 glass. Results indicated that slurry pH 9, pressure 3 psi and pad speed 60 rpm can provide excellent FAP self-conditioning to polish K9 glass. MRR and wear ratio maintain high levels during the whole polishing process, which indicates a better machining capability of FAP. So FAP can obtain a better self-conditioning performance by adjusting process parameters in micro/nano machining, which improves the processing efficiency and prolongs the service life of FAP, simultaneously.