Abstract
We investigate the impact of post-treatment on photocatalytic oxidation activity of (111) oriented NaNbO3 film prepared by pulse laser deposition. Some impurities such as Na2Nb4O11 and bigger particles appear in the treated samples. The activity of rhodamine B degradation with N2 purge increases with the amount of ⋅OH, the sample treated under H2/Ar(7%) being the highest activity, followed by under air and untreated one; the opposite trend is observed when the system was without N2 purge.
Highlights
We investigate the impact of post-treatment on photocatalytic oxidation activity of (111) oriented NaNbO3 film prepared by pulse laser deposition
We identified that the (111) plane is the most highly active for degrading organic compound using the oriented NN film on the LaAlO3 single crystal substrate prepared by pulsed laser deposition (PLD).[11]
We investigated the effect of post-treatment under H2/Ar(7%) and air on photocatalytic oxidation activity of (111) oriented NN film
Summary
We investigate the impact of post-treatment on photocatalytic oxidation activity of (111) oriented NaNbO3 film prepared by pulse laser deposition. Effect of post-treatment on photocatalytic oxidation activity of (111) oriented NaNbO3 film
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