Abstract
Development-free vapor photolithography (DFVP) is a new technology, which is based on the reaction of SiO 2 with HF vapor under a polymer film in the presence of accelerators. This paper discusses the effect of functional groups of polymers, glass transition temperature ( T g), film thickness, and etching temperature on the reaction. The results demonstrate that polymers with carbonyl, nitro, amino, amino formacyl, and other polar functional groups act not only as film formers but also as accelerators of the etching reaction of SiO 2 with HF.
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