Abstract
Polymethyl methacrylate (PMMA) photonic crystal has been prepared on quartz substrate by the self-assembly vertical deposition technique. YVO4:Eu3+ inverse opal was obtained by annealing PMMA photonic crystal infiltrated with YVO4:Eu3+ nanophosphors at 500°C for 3 h. Scanning electron microscopy confirmed the development of the photonic and inverse opal structures. Photoluminescence study showed that the luminescence characteristics depended on the position of the photonic stop band. It was observed that the photoluminescence intensity of YVO4:Eu3+ inverse opal was enhanced near the photonic stop bandgap edge as compared with the intensity of a YVO4:Eu3+ nanophosphor powder sample.
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