Abstract
WO3 is an essential material for energy storage and catalytical technology, the oxygen vacancies level will play an essential role in its potential application. In this paper, porous tungsten oxide (WO3–x) with various oxygen contents was quickly fabricated by a microwave plasma-enhanced chemical vapor deposition method. A detailed characterization of structure and morphology features with the plasma handling process was recorded by X-ray diffraction, field-emission scanning electron microscopy and transmission electron microscopy, respectively. The etching mechanism of porous WO3–x under H2 plasma was discussed based on the systemically characterization. These results will help us to design the active sites or structure in the metal oxide materials.
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