Abstract
Amorphous thin films of titanium oxide (TiOx) have been deposited on K9 glass substrates by dc reactive magnetron sputtering from a pure titanium target at different oxygen partial pressure. The structure and composition of these films have been characterized by x-ray diffraction (XRD), and x-ray photoelectron spectroscopy (XPS), respectively. The effects of the oxygen partial pressure on the composition and optical properties of amorphous TiOx thin films have been mainly investigated. Analyses of transmittance, reflectance, optical band gap of the films demonstrate that the oxygen partial pressure during the sputtering plays a very important role in their optical properties.
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