Abstract
We have measured secondary ion emission of Al + and O −, and the O-KLL Auger signal, from Al exposed to oxygen at different stages in the sputter removal of the adsorbed oxygen. We observe changes in the O-Auger spectrum which we postulate can be correlated with adsorbed and incorporated oxygen. From this assumption, we obtain that secondary ion signals are proportional to the amount of incorporated oxygen but not of adsorbed oxygen. Our results suggest that it is possible that “intrinsic” ion yields from assumedly clean elemental targets are largely due to the presence of oxygen impurities.
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