Abstract
We investigated the effect of oxygen growth-pressure on the structural and magnetic properties of epitaxial YIG thin films. YIG films were grown on single crystalline GGG substrates with (111) orientations by pulse laser deposition technique. In-situ oxygen-gas pressure variations in the range of 0.0025–0.15 mbar was adopted to demonstrate the perfect growth. Structural analysis confirmed that the films were single crystalline in nature. Atomic force microscopy analysis indicated that roughness of the films decreases with increase of oxygen pressure. Saturation magnetization was enhanced by a factor of 17% over increase of oxygen pressure. Through angular dependent ferromagnetic resonance (FMR) measurements along film’s in-plane (φ-variation) and out-of-plane (θ-variation) geometries, resonance fields [HrθH,φH] and FMR linewidths [∆HrθH,φH] were obtained. Using theoretical analysis important material parameters such as; saturation magnetization, gyromagnetic ratio, uniaxial anisotropy, cubic anisotropy and Gilbert damping were evaluated. We have obtained lowest Gilbert damping ~4.37×10−5 for 0.15 mbar oxygen pressure deposited YIG film.
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