Abstract
The vanadium oxide thin films were deposited on glass substrate using DC reactive magnetron sputtering method. The effect of O2flow rate on the phase transformation, microstructure and surface morphology of thin films was studied by X-ray diffractometer, Raman spectroscopy and Field emission scanning electron microscopy (FESEM), respectively. The obtained results indicated that the O2 flow rate affected the lattice structure integrity significantly. In addition, the surface morphology of vanadium oxidethin films were depends strongly on the O2 flow rates.
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