Effect of oblique angle on dynamic magnetic properties of FeSiAl–SiO2 thin films fabricated by oblique co-sputtering method

Abstract

In this work, we investigate the dynamic magnetic properties and their thermostability in the temperature range of 300 to 420 K for FeSiAl–SiO2 thin films fabricated by hybrid oblique co-sputtering technique systematically. The magnetic anisotropy field HK and ferromagnetic resonance frequency fFMR can be tuned from 14.66 to 85.32 Oe and 1.13 to 2.62 GHz respectively, by adjusting the oblique angle β, which can be elucidated with respect to the contribution of reinforced shape and stress-induced anisotropies. Moreover, the thermostability of FeSiAl–SiO2 films in terms of HK and fFMR are enhanced with the increase of β up to 35° while the thermostability of effective Gilbert damping factor αeff and the maximum imaginary permeability μ″max are enhanced with the increasing of β up to 45° and the involved mechanisms are analyzed in detail.