Abstract
Fluorocarbon (FC) film is used in micro-electro-mechanical system (MEMS) processes as an anti-stiction layer. We studied the effect of O 2 pretreatment on FC film using an X-ray photoelectron spectroscope (XPS) and atomic force microscope (AFM) to measure the surface roughness and to characterize the composition of the film. CF and CF 3 were observed for all temperatures at 6.67 Pa. A high oxygen concentration was found in the film deposited at 250°C. An AFM analysis of the surface roughness showed agglomeration on the film surface, while none was found on the films deposited at 25°C and 100°C. Therefore, the O 2 pretreatment seemed to facilitate oxidation at a deposition temperature of 250°C. Since our results showed that a smooth anti-stiction layer could be deposited at 100°C without any oxidation occurring, the optimum conditions for FC deposition were 100°C at a pressure of 6.67 Pa. Therefore, this study showed an important relationship between O 2 pretreatment and deposition temperature.
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