Abstract
Vertically aligned carbon nanotubes were grown on Ni-coated Si substrates using microwave-plasma enhanced chemical vapor deposition. The surface morphology of Ni thin films was varied with the rf power density during the sputtering process. It was found that the growth of carbon nanotubes was strongly influenced by the surface morphology of Ni thin film. Pure carbon nanotubes were synthesized on the Ni thin film with uniformly distributed small grain sizes, whereas a lot of carbonaceous particles were produced in addition to the nanotubes, when the nanotubes were grown on the Ni film with widely distributed grain sizes. With decreasing Ni-grain size, the diameter and the wall-number of carbon nanotubes decreased while the length and the density of the nanotubes increased.
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