Abstract
Titanium dioxide films of different thicknesses, ranging from 10 to 110 nm were deposited on glass substrate, at room temperature by physical vapor deposition method. Topography, roughness and crystallography of produced layers were determined by AFM and XRD methods respectively. Optical properties were measured by transmission spectroscopy in the spectral range of 300–1100 nm wave length range. The optical constants were obtained using Kramers-Kronig analysis of the reflectivity curves. It was found that film thickness plays an important role on the nanostructures as well as optical properties of layers and cause significant variations in behavior of thin titanium oxide films.
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